Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Directed Self-assembly of Topcoat-free, Integration-friendly High-χ Block Copolymers
Ankit Vora, Anindarupa Chunder, Melia Tjio, Srinivasan Balakrishman, Elizabeth Lofano, Joy Cheng, Daniel P. Sanders, Eri Hirahara, Yasushi Akiyama, Orest Polishchuk, Margareta Paunescu, Durairaj Baskaran, SungEun Hong, Guanyang Lin
Author information
Keywords: Directed self-assembly, organic high-Χ block copolymers, topcoat-free, perpendicular lamellae and cylinders
JOURNAL FREE ACCESS

2014 Volume 27 Issue 4 Pages 419-424

Details
Download PDF (1892K)
Download citation RIS

(compatible with EndNote, Reference Manager, ProCite, RefWorks)

BIB TEX

(compatible with BibDesk, LaTeX)

Text
How to download citation
Contact us
Abstract

To extend the scaling beyond the most widely used poly(styrene-b-methyl methacrylate) (PS-b-PMMA), organic high-χ block copolymers (BCPs) were developed. Vertically oriented BCP domains were obtained by simple coat and bake process without application of an additional layer of a topcoat material. In addition, process-friendly conditions including low bake temperature (< 200 °C) and short bake time (≤ 5 min) provided a simple scheme to integrate these high-χ block copolymers to standard lithography process and pre-patterns defined by 193i lithography. Successful demonstration of directed self-assembly of these high-χ block copolymers on 193i-defined guiding pre-patterns offers a simple route to access well-aligned perpendicular lamellae and cylinders with a pitch less than 20 nm.

Content from these authors
© 2014 The Society of Photopolymer Science and Technology (SPST)
Previous article Next article
Favorites & Alerts

Recently viewed articles
Share this page
feedback
 Top